On the description of metal ion return in reactive high power impulse magnetron sputtering [Elektronisk resurs]
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Kubart, Tomas, 1977- (författare)
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Fernandes, Daniel Luis Abreu (författare)
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Nyberg, Tomas (författare)
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Uppsala universitet Teknisk-naturvetenskapliga vetenskapsområdet (utgivare)
- Publicerad: ELSEVIER SCIENCE SA, 2021
- Engelska.
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Ingår i: Surface & Coatings Technology. - 0257-8972. ; 418
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Sammanfattning
Ämnesord
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- Back-attraction of ionized metal is an important process in reactive high power impulse magnetron sputtering (R-HiPIMS). Here, we discuss the implementation of the metal return in balance type models for reactive magnetron sputtering. We show that the existing description of surface processes needs to be modified to satisfy mass conservation. A new steady-state time-averaged model is presented and used to evaluate the effect of the metal return in R-HiPIMS. The results show that the metal return leads to an increased oxide fraction in the deposited coating in R-HiPIMS. This effect can explain the high rate deposition of stoichiometric compounds deposited in the metal mode of operation that has been observed experimentally.
Ämnesord
- Engineering and Technology (hsv)
- Materials Engineering (hsv)
- Manufacturing, Surface and Joining Technology (hsv)
- Teknik och teknologier (hsv)
- Materialteknik (hsv)
- Bearbetnings-, yt- och fogningsteknik (hsv)
- Natural Sciences (hsv)
- Chemical Sciences (hsv)
- Materials Chemistry (hsv)
- Naturvetenskap (hsv)
- Kemi (hsv)
- Materialkemi (hsv)
Genre
- government publication (marcgt)
Indexterm och SAB-rubrik
- Reactive sputtering
- Reactive HiPIMS
- Thin films
- Process modelling
- Metal back-attraction
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Surface & Coatings Technology