Design Optimization and Realization of 4H-SiC Bipolar Junction Transistors [Elektronisk resurs]
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Elahipanah, Hossein, 1982- (författare)
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Östling, Mikael (preses)
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Zetterling, Carl-Mikael (preses)
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Hallèn, Anders (preses)
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Schöner, Adolf (preses)
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Kimoto, Tsunenobu (opponent)
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Electronics (medarbetare)
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KTH Skolan för informations- och kommunikationsteknik (ICT) (utgivare)
- Publicerad: Stockholm : KTH Royal Institute of Technology, 2017
- Engelska 116
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Sammanfattning
Ämnesord
Stäng
- 4H-SiC-based bipolar junction transistors (BJTs) are attractive devices for high-voltage and high-temperature operations due to their high current capability, low specific on-resistance, and process simplicity. To extend the potential of SiC BJTs to power electronic industrial applications, it is essential to realize high-efficient devices with high-current and low-loss by a reliable and wafer-scale fabrication process. In this thesis, we focus on the improvement of the 4H-SiC BJT performance, including the device optimization and process development. To optimize the 4H-SiC BJT design, a comprehensive study in terms of cell geometries, device scaling, and device layout is performed. The hexagon-cell geometry shows 42% higher current density and 21% lower specific on-resistance at a given maximum current gain compared to the interdigitated finger design. Also, a layout design, called intertwined , is used for 100% usage of the conducting area. A higher current is achieved by saving the inactive portion of the conducting area. Different multi-step etched edge termination techniques with an efficiency of >92% are realized. Regarding the process development, an improved surface passivation is used to reduce the surface recombination and improve the maximum current gain of 4H-SiC BJTs. Moreover, wafer-scale lift-off-free processes for the n- and p-Ohmic contact technologies to 4H-SiC are successfully developed. Both Ohmic metal technologies are based on a self-aligned Ni-silicide (Ni-SALICIDE) process. Regarding the device characterization, a maximum current gain of 40, a specific on-resistance of 20 mΩ·cm 2 , and a maximum breakdown voltage of 5.85 kV for the 4H-SiC BJTs are measured. By employing the enhanced surface passivation, a maximum current gain of 139 and a specific on-resistance of 579 mΩ·cm 2 at the current density of 89 A/cm 2 for the 15-kV class BJTs are obtained. Moreover, low-voltage 4H-SiC lateral BJTs and Darlington pair with output current of 1−15 A for high-temperature operations up to 500 ° C were fabricated. This thesis focuses on the improvement of the 4H-SiC BJT performance in terms of the device optimization and process development for high-voltage and high-temperature applications. The epilayer design and the device structure and topology are optimized to realize high-efficient BJTs. Also, wafer-scale fabrication process steps are developed to enable realization of high-current devices for the real applications.
Ämnesord
- Engineering and Technology (hsv)
- Electrical Engineering, Electronic Engineering, Information Engineering (hsv)
- Teknik och teknologier (hsv)
- Elektroteknik och elektronik (hsv)
- Electrical Engineering (kth)
- Elektro- och systemteknik (kth)
- Informations- och kommunikationsteknik (kth)
- Information and Communication Technology (kth)
Indexterm och SAB-rubrik
- 4H-SiC
- BJT
- high-voltage and ultra-high-voltage
- high-temperature
- self-aligned Ni-silicide (Ni-SALICIDE)
- lift-off-free
- wafer-scale
- current gain
- Darlington
Inställningar
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