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Fager, Hanna
(författare)
Growth and properties of amorphous Ti-B-Si-N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB 2 and Si targets [Elektronisk resurs]
- E-artikel/E-kapitelEngelska2014
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Nummerbeteckningar
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LIBRIS-ID:22070137
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http://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-106574uri
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urn:nbn:se:liu:diva-106574urn
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10.1016/j.surfcoat.2014.10.053doi
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Published
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gratis
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Amorphous nitrides are explored for their homogenous structure and potential use as wear-resistant coatings, beyond their much studied nano-and microcrystalline counterparts. (TiB 2 ) 1−x Si x N y thin films were deposited on Si(001) substrates by a hybrid technique of high power impulse magnetron sputtering (HIPIMS) combined with dc magnetron sputtering (DCMS) using TiB 2 and Si targets in a N 2 /Ar atmosphere. By varying the sputtering dc power to the Si target from 200 to 2000 W while keeping the average power to the TiB 2 -target, operated in HIPIMS mode, constant at 4000 W, the Si content in the films increased gradually from x=0.01 to x=0.43. The influence of the Si content on the microstructure, phase constituents, and mechanical properties were systematically investigated. The results show that the microstructure of as-deposited (TiB 2 ) 1−x Si x N y films changes from nanocrystalline with 2-4 nm TiN grains for x=0.01 to fully electron diffraction amorphous for x=0.22. With increasing Si content, the hardness of the films increases from 8.5 GPa with x=0.01 to 17.2 GPa with x=0.43.
Ämnesord och genrebeteckningar
Biuppslag (personer, institutioner, konferenser, titlar ...)
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Greczynski, Grzegorz
(författare)
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Jensen, Jens
(författare)
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Lu, Jun
(författare)
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Hultman, Lars
(författare)
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Linköpings universitetInstitutionen för fysik, kemi och biologi
(utgivare)
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Linköpings universitetTekniska högskolan
(utgivare)
Sammanhörande titlar
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Del av/supplement till:channel record
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Ingår i:VärdpublikationSurface & Coatings Technology259, 442-4470257-8972
Internetlänk
Länkade data-URI:er (test)
- 264446 (Naturvetenskap hsv)
- 274895 (Fysik hsv)
- 243422 (Linköpings universitet Institutionen för fysik, kemi och biologi pbl)
- 214173 (Linköpings universitet Tekniska högskolan pbl)
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